Chemical cleaning device and method for plates

• Main Authors: CHEN XIN, DONG WENHAO, LIU JIE, QUAN JIFENG, ZHOU LINLIN, FAN QINGSONG, CUI SHUN, WANG SONGYUAN
• Format: Patent
• Language: Chinese; English
• Published: 07.05.2021
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLEANING; CLEANING IN GENERAL; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

The invention discloses a chemical cleaning device for plates. The chemical cleaning device for plates comprises a frame body, a perforated material plate and two movers; each mover comprises two partition plate clamps which are slidably connected with the frame body, and a partition frame plate is fixedly installed between the two partition plate clamps; grooves are formed in the partition frame plates; bolts for fixing the movers are further arranged on the partition plate clamps; and a hanging ring is arranged on the frame body. In addition, the invention discloses a chemical cleaning method for plates. According to the method, zirconium alloy plates are clamped in the corresponding grooves in the partition frame plates of the two movers and then cleaned, and the cleaned zirconium alloy plates are obtained. The zirconium alloy plates are clamped in the frame body through the movers, and the grooves are controlled to be located between two rows of holes of the perforated material plate, so that uniform corr