NON-CONTACT ROTARY UNION

Embodiments described herein relate to rotary unions for use in wafer cleaning processes. The rotary union includes a process media and a supporting media that interact in a gap between a nozzle and rotary element. By regulating the supporting media pressure, a non-contact seal is created within the...

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Bibliographic Details
Main Author GOLUBOVSKY EDWARD
Format Patent
LanguageChinese
English
Published 23.04.2021
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Summary:Embodiments described herein relate to rotary unions for use in wafer cleaning processes. The rotary union includes a process media and a supporting media that interact in a gap between a nozzle and rotary element. By regulating the supporting media pressure, a non-contact seal is created within the gap. The non-contact seal prevents or controls process media leakage in a rotary union while enabling delivery of the process media through a platen directly underneath of a wafer without the risk of additional contamination of the process media, reducing the defect to the wafer. Additionally, the non-contact seal precludes particle generation due to seal wear, caused for example in face seals, and does not leech out any additional foreign elements. 本文描述的实施例涉及用于晶片清洁工艺的旋转接头。旋转接头包括工艺介质和支撑介质,工艺介质与支撑介质在喷嘴与旋转元件之间的间隙中相互作用。通过调节支撑介质的压力,在间隙内创建非接触式密封。非接触式密封防止或控制在旋转接头内的工艺介质的泄漏,同时使得能够将工艺介质通过压板直接输送到晶片下方,而不会有工艺介质的额外污染的风险,从而减少对晶片产生的缺陷。另外,非接触式密封防止由于例如在面密封件中引起的密封磨损而产生的颗粒,并且不会排出任何额外的外来元素。
Bibliography:Application Number: CN201980060096