Wafer cleaning system

The invention discloses a wafer cleaning system, and the system comprises a feeding control module, a discharging control module, a manipulator control module, a lower computer, a feeding module, a discharging module, a process tank module and a manipulator conveying module. The feeding control modu...

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Bibliographic Details
Main Author SHEN PEIXUN
Format Patent
LanguageChinese
English
Published 16.04.2021
Subjects
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
TRANSPORTING
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Summary:The invention discloses a wafer cleaning system, and the system comprises a feeding control module, a discharging control module, a manipulator control module, a lower computer, a feeding module, a discharging module, a process tank module and a manipulator conveying module. The feeding control module, the discharging control module and the manipulator control module are all in control connection with the lower computer; the feeding module is in control connection with the feeding control module and used for conveying the wafer bearing device to the feeding conveying position from the feeding position; the discharging module is in control connection with the discharging control module and used for conveying the wafer bearing device from the discharging conveying position to the discharging position; the process tank module is located between the feeding module and the discharging module; and the manipulator conveying module is in control connection with the manipulator control module and is used for conveying
Bibliography:Application Number: CN202011553797