CLEANING DEVICE
The embodiment of the invention relates to a cleaning device. The cleaning device includes: a surface interaction layer (ML); a cleaning fluid supply portion (CFF) provided with a cleaning fluid passage (CFC) at the surface interaction layer (ML) for supplying a cleaning fluid (CF) to the surface (F...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
12.03.2021
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The embodiment of the invention relates to a cleaning device. The cleaning device includes: a surface interaction layer (ML); a cleaning fluid supply portion (CFF) provided with a cleaning fluid passage (CFC) at the surface interaction layer (ML) for supplying a cleaning fluid (CF) to the surface (F) by contact with the surface (F) through the surface interaction layer (ML); and a dirty fluid discharge portion (DFD) provided with a dirty fluid passage (DFC) at the surface interaction layer (ML) for discharging dirty water by means of negative pressure through contact of the surface interactionlayer (ML) with the surface (F).
本公开的实施例涉及清洁装置。一种清洁装置包括:表面相互作用层(ML);清洁流体供应部(CFF),其在表面相互作用层(ML)处设有清洁流体通道(CFC),以用于通过表面相互作用层(ML)与表面(F)接触来将清洁流体(CF)供应给表面(F);以及脏流体排出部(DFD),其在表面相互作用层(ML)处设有脏流体通道(DFC),以用于通过表面相互作用层(ML)与表面(F)接触借助于负压来排出脏水。 |
---|---|
Bibliography: | Application Number: CN202011313518 |