Low cross-axis crosstalk sensitive structure and manufacturing method thereof

• Main Authors: WANG CHENSHENG, GENG ANBING, DONG TINGTING, WANG JIANBO, YAO YUAN
• Format: Patent
• Language: Chinese; English
• Published: 02.03.2021
• Subjects: INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT; MEASURING; MEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION,OR SHOCK; PHYSICS; TESTING

The invention relates to a low-cross-axis crosstalk sensitive structure and a manufacturing method thereof, the low-cross-axis crosstalk sensitive structure is located right below a diffraction grating in an optical micro-accelerometer, and the sensitive structure comprises an inertial mass block, a silicon substrate, a cantilever beam and a glass substrate with a cavity; the low-cross-axis crosstalk sensitive structure comprises an inertial mass block, a silicon substrate, cantilever beams and a glass substrate with a cavity, wherein a cavity is longitudinally formed in the middle of the silicon substrate, and the inertia mass block is arranged in the cavity of the silicon substrate; the cantilever beams are of a snake-shaped zigzag structure, and the two ends of each cantilever beam areconnected with the inertia mass block and the inner wall of the silicon substrate cavity respectively; the outer edge of the glass substrate is fixedly connected with the outer edge of the silicon substrate, and the cavity of