Low cross-axis crosstalk sensitive structure and manufacturing method thereof
The invention relates to a low-cross-axis crosstalk sensitive structure and a manufacturing method thereof, the low-cross-axis crosstalk sensitive structure is located right below a diffraction grating in an optical micro-accelerometer, and the sensitive structure comprises an inertial mass block, a...
Saved in:
Main Authors | , , , , |
---|---|
Format | Patent |
Language | Chinese English |
Published |
02.03.2021
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | The invention relates to a low-cross-axis crosstalk sensitive structure and a manufacturing method thereof, the low-cross-axis crosstalk sensitive structure is located right below a diffraction grating in an optical micro-accelerometer, and the sensitive structure comprises an inertial mass block, a silicon substrate, a cantilever beam and a glass substrate with a cavity; the low-cross-axis crosstalk sensitive structure comprises an inertial mass block, a silicon substrate, cantilever beams and a glass substrate with a cavity, wherein a cavity is longitudinally formed in the middle of the silicon substrate, and the inertia mass block is arranged in the cavity of the silicon substrate; the cantilever beams are of a snake-shaped zigzag structure, and the two ends of each cantilever beam areconnected with the inertia mass block and the inner wall of the silicon substrate cavity respectively; the outer edge of the glass substrate is fixedly connected with the outer edge of the silicon substrate, and the cavity of |
---|---|
Bibliography: | Application Number: CN202011282666 |