TRANSISTOR ARRAYS
A technique of producing a device comprising a stack of layers defining an array of transistors and including one or more electrically conductive connections between levels, wherein the method comprises: forming a source-drain conductor pattern defining an array of source conductors each providing a...
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Main Authors | , |
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Format | Patent |
Language | Chinese English |
Published |
05.02.2021
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Subjects | |
Online Access | Get full text |
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Summary: | A technique of producing a device comprising a stack of layers defining an array of transistors and including one or more electrically conductive connections between levels, wherein the method comprises: forming a source-drain conductor pattern defining an array of source conductors each providing an addressing line for a respective set of transistors of the transistor array, and an array of drainconductors each associated with a respective transistor of the transistor array; wherein forming said source-drain conductor pattern comprises: forming a first conductor subpattern which comprises conductor material at least in the regions of the addressing lines and provides the conductive surface of the source-drain conductor pattern at least in the regions where the source and drain conductorsare in closest proximity; masking the first conductor subpattern in regions where the source and drain conductors are in closest proximity; thereafter forming a second conductor subpattern, which also comprises conductor mate |
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Bibliography: | Application Number: CN201980043952 |