Low-RDA friction type silicon dioxide and preparation method thereof

• Main Authors: HOU CANMING, LIN CHAOCONG, HU FEI, MA YIMIN, ZHANG WENZHENG
• Format: Patent
• Language: Chinese; English
• Published: 26.01.2021
• Subjects: CHEMISTRY; COMPOUNDS THEREOF; HUMAN NECESSITIES; HYGIENE; INORGANIC CHEMISTRY; MEDICAL OR VETERINARY SCIENCE; METALLURGY; NON-METALLIC ELEMENTS; PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES; SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS

The invention belongs to the technical field of silicon dioxide, and particularly relates to low-RDA friction type silicon dioxide and a preparation method thereof. According to the method, a sodium silicate solution with the modulus of 3 and the concentration of 0.71-0.77 mol/L is adopted for react...