Low-RDA friction type silicon dioxide and preparation method thereof

The invention belongs to the technical field of silicon dioxide, and particularly relates to low-RDA friction type silicon dioxide and a preparation method thereof. According to the method, a sodium silicate solution with the modulus of 3 and the concentration of 0.71-0.77 mol/L is adopted for react...

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Bibliographic Details
Main Authors HOU CANMING, LIN CHAOCONG, HU FEI, MA YIMIN, ZHANG WENZHENG
Format Patent
LanguageChinese
English
Published 26.01.2021
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Summary:The invention belongs to the technical field of silicon dioxide, and particularly relates to low-RDA friction type silicon dioxide and a preparation method thereof. According to the method, a sodium silicate solution with the modulus of 3 and the concentration of 0.71-0.77 mol/L is adopted for reaction, neutralization reaction is carried out by dropwise adding alkali into acid, and a silane coupling agent KH570 is added in the process, so that the low-RDA friction type silicon dioxide is prepared. The copper consumption value of the prepared friction type silicon dioxide in 15% dispersion liquid of sorbitol with the concentration of 70% can be as low as 1.2 mg in 10000 times of brushing and grinding, the RDA value is 120-130, the water absorption capacity is 12-16 mL/20 g, the oil absorption value is 86-101 mL/100 g, the apparent density is 0.47-0.51 g/mL, and the friction capacity of the silicon dioxide is reduced. A toothpaste prepared from the silicon dioxide provided by the invention is suitable for the e
Bibliography:Application Number: CN202011146012