Nanoimprint lithography device based on non-resonance assistance

• Main Authors: LU FAXIANG, XU HONGYU, DAI DE'EN, LIN JIEQIONG, XIN CHENGLEI, KANG MINGSHUO, XU ZHENPAN, FENG KAITUO, ZHANG ZHAOJIE, YAN JIAXUAN, YI ZHENGFA, DUAN XINGXIN, GU YAN, CHEN SI, LI XIANYAO
• Format: Patent
• Language: Chinese; English
• Published: 12.01.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a nanoimprint lithography device based on non-resonance assistance, which comprises the following steps: firstly, a substrate is placed in a substrate chuck, a Y-axis displacement platform and an X-Z-axis displacement platform are adjusted to enable the substrate to move right below a template, and then the X-Z-axis displacement platform is controlled to enable the imprintlithography device to move downwards until the imprint device is in micro contact with the substrate; the X-Z-axis displacement platform is controlled to carry out imprinting, the Z-direction vibration platform is used for applying Z-direction vibration to a substrate while imprinting is carried out, then a cooling device is used for carrying out cooling solidification on the substrate, and finally demolding is carried out through an uncovering type vibration assisting method. According to the invention, the Z-direction vibration platform is adopted to drive the substrate to carry out imprinting, so that the filling r