Nanoimprint device and method capable of preparing super-hydrophobic microstructure

• Main Authors: LIU AO, LU FAXIANG, DAI DE'EN, XU HONGYU, LIN JIEQIONG, XU ZHENPAN, KANG MINGSHUO, ZHANG ZHAOJIE, FENG KAITUO, YAN JIAXUAN, YI ZHENGFA, DUAN XINGXIN, GU YAN, CHEN SI, LI XIANYAO
• Format: Patent
• Language: Chinese; English
• Published: 12.01.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention relates to a nanoimprint device and method capable of preparing a super-hydrophobic microstructure. The nanoimprint method comprise the steps of firstly, evenly smearing imprint glue benzyl mercaptan palladium on the surface of a first substrate and the surface of a second substrate through a first gluing device and a second gluing device; then respectively imprinting the substrate Iand the substrate II by an imprinting device I and an imprinting device II to obtain a substrate I with a longitudinal grating structure and a substrate II with a transverse grating structure, and carrying out high-temperature treatment on the substrate I for one hour to convert the benzyl mercaptan palladium grating into a metal palladium grating; and separating the transverse grating from the substrate II under the action of an imprinting device III, adhering the transverse grating to the longitudinal grating to form a stacked structure, and performing high-temperature treatment for one hour to convert the transver