Holding device, exposure device, and article manufacturing method

• Main Authors: TSUJI MINORU, NAKASHIMA TAKESHI, MASATO HAKIRI
• Format: Patent
• Language: Chinese; English
• Published: 29.12.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention provides a holding device, an exposure apparatus, and an article manufacturing method. In order to provide a holding device capable of holding an optical element so as to reproduce the shape of an optical surface, the holding device according to the present invention holds the optical element so that the surface normal to the optical surface of the optical element is not parallel tothe direction of gravity, and is provided with: a pedestal for holding the optical element, and a mounting table on which the pedestal is mounted; one of the contact surfaces of the pedestal and the carrying table is a curved surface; and a pressing mechanism that presses the optical element with a predetermined pressing force from both sides with a first cross-section perpendicular to the plane normal therebetween. 本发明提供一种保持装置、曝光装置、物品制造方法。为了提供能够以再现光学面的形状的方式保持光学元件的保持装置，本发明所涉及的保持装置以使光学元件的光学面的面法线与重力方向非平行的方式，保持光学元件，其中，具备：保持光学元件的台座及载置台座的载置台，台座及载置台相互针对的接触面的一方是曲面；以及按压机构，夹着与面法线垂直的第1剖面，从两侧以预定的按压力按压光学元件。