Moistening and acne-removing composition and moistening and acne-removing facial mask

The invention discloses a moistening and acne-removing composition and a moistening and acne-removing facial mask. The above moistening and acne-removing composition comprises the following ingredients: Carica papaya L. extracts, Salix alba L. extracts, radix salviae miltiorrhizae extracts, rhizoma...

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Bibliographic Details
Main Author ZHANG QIANGLIN
Format Patent
LanguageChinese
English
Published 22.12.2020
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Summary:The invention discloses a moistening and acne-removing composition and a moistening and acne-removing facial mask. The above moistening and acne-removing composition comprises the following ingredients: Carica papaya L. extracts, Salix alba L. extracts, radix salviae miltiorrhizae extracts, rhizoma paridis extracts, scutellariae radix extracts, ginseng radix extracts, harba dendrolii nobilis extracts and black ganoderma extracts. The moistening and acne-removing facial mask comprises the moistening and acne-removing facial composition and facial mask solving liquid, wherein the facial mask solving liquid comprises deionized water, Lavandula angustifolia Mill. essential oil, glycine, glycerin and propylene glycol. The moistening and acne-removing facial mask disclosed by the invention is pure natural and additive-free, can be effectively absorbed by the skin, can effectively eliminate inflammation and can accelerate the skin to be moisturized and smooth. 本发明公开了清润祛痘组合物及清润祛痘面膜。上述的清润祛痘组合物,包括如下组分:番木瓜提取物、白柳提取物、丹参提取
Bibliography:Application Number: CN201910531477