SEMICONDUCTOR DEVICE

A semiconductor device is provided, comprising a substrate; a first conductive pattern on the substrate; a second conductive pattern on the substrate and spaced apart from the first conductive pattern; an air spacer between the first conductive pattern and the second conductive pattern; and a quantu...

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Bibliographic Details
Main Authors IM JI WOON, CHOI BYOUNG DEOG
Format Patent
LanguageChinese
English
Published 01.12.2020
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Summary:A semiconductor device is provided, comprising a substrate; a first conductive pattern on the substrate; a second conductive pattern on the substrate and spaced apart from the first conductive pattern; an air spacer between the first conductive pattern and the second conductive pattern; and a quantum dot pattern covering an upper part of the air spacer. 提供一种半导体器件,所述半导体器件包括:基底;第一导电图案,位于基底上;第二导电图案,位于基底上,并与第一导电图案间隔开;空气间隔件,位于第一导电图案与第二导电图案之间;以及量子点图案,覆盖空气间隔件的上部。
Bibliography:Application Number: CN202010404700