APPARATUS FOR REMOVING RESIDUES FROM SOURCE VESSEL

An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft directio...

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Bibliographic Details
Main Authors CHOI MIN-SEOK, PARK JONG-BIN, LEE JIN-HWAN, CHOI IN-HO, YU HO, KIM JEONG-GIL
Format Patent
LanguageChinese
English
Published 17.11.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:An apparatus for removing residues from a source vessel in an extreme ultraviolet lithography device, the apparatus including a frame portion, and a heater structure on the frame portion, the heater structure having a head on the frame portion, the head being rotatable in at least one shaft direction, and a heater on the head to dissipate heat toward residues in the source vessel, the heater to apply temperature of 200 DEG C to 800 DEG C. 提供了一种从源容器去除残留物的设备，所述设备包括框架部分以及框架部分上的加热器结构，该加热器结构具有：框架部分上的头部，该头部在至少一个轴向上可旋转，以及头部上的加热器，其朝着源容器中的残留物散热，加热器施加200℃至800℃的温度。
Bibliography:Application Number: CN202010411668