PARTLY SEALED ION GUIDE AND ION BEAM DEPOSITION SYSTEM

Disclosed herein is an ion guide (32) for guiding an ion beam along an ion path, said ion guide (32) having a longitudinal axis (48) which corresponds to said ion path. Said ion guide (32) comprises aplurality of electrode plates (44) which are arranged perpendicularly to the longitudinal axis (48),...

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Bibliographic Details
Main Authors SCHLICHTING HARTMUT, KAPOSI TOBIAS, WALZ ANDREAS, BARTH JOHANNES
Format Patent
LanguageChinese
English
Published 13.11.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Summary:Disclosed herein is an ion guide (32) for guiding an ion beam along an ion path, said ion guide (32) having a longitudinal axis (48) which corresponds to said ion path. Said ion guide (32) comprises aplurality of electrode plates (44) which are arranged perpendicularly to the longitudinal axis (48), each electrode plate (44) having an opening and being arranged such that said longitudinal axis (48) extends through its respective opening, wherein said openings collectively define an ion guide volume (49). The ion guide (32) extends or is configured to extend through a separation wall (20) separating adjacent first and second pumping chambers (12, 14). The ion guide (32) has a first portion (52), in which gaps are formed between at least some of said electrode plates (44) such that uncharged gas can escape from said ion guide volume (49), wherein said first portion (52) is completely located in said first pumping chamber (12). A second portion (54), in which sealing elements (46) are arranged between adjacent e
Bibliography:Application Number: CN201980024674