Beam-forming and illuminating system for a lithography system, lithography system, and method

The invention relates to a beam-forming and illuminating system (200) for a lithography system (100A, 100B), in particular for a EUV lithography system, comprising an optical element (202, 204, 206, 208) and an adjusting device (700), which is designed, during a heat-up phase of the beam-forming and...

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Bibliographic Details
Main Authors ABELE KLAUS, LIEBAUG BJORN, HOLDERER HUBERT
Format Patent
LanguageChinese
English
Published 30.10.2020
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:The invention relates to a beam-forming and illuminating system (200) for a lithography system (100A, 100B), in particular for a EUV lithography system, comprising an optical element (202, 204, 206, 208) and an adjusting device (700), which is designed, during a heat-up phase of the beam-forming and illuminating system (200), to measure a field position and/or a pupil position of the beam-formingand illuminating system (200) and to adjust the orientation and/or position of the optical element (202, 204, 206, 208) in dependence on the measured field position and/or pupil position in order to keep the optical element (202, 204, 206, 208) in a desired position (SL). 本发明涉及一种光刻设备(100A，100B)的束形成和照明系统(200)，特别是EUV光刻系统的束形成和照明系统，其包括：光学元件(202，204，206，208)，以及调节装置(700)，该调节装置设计为在束形成和照明系统(200)的加热阶段期间测量束形成和照明系统(200)的场位置和/或光瞳位置，并且根据所测量的场位置和/或光瞳位置调节光学元件(202，204，206，208)的取向和/或位置，以便将光学元件(202，204，206，208)保持在期望位置(SL)中。
Bibliography:Application Number: CN201980019157