Beam-forming and illuminating system for a lithography system, lithography system, and method
The invention relates to a beam-forming and illuminating system (200) for a lithography system (100A, 100B), in particular for a EUV lithography system, comprising an optical element (202, 204, 206, 208) and an adjusting device (700), which is designed, during a heat-up phase of the beam-forming and...
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Main Authors | , , |
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Format | Patent |
Language | Chinese English |
Published |
30.10.2020
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a beam-forming and illuminating system (200) for a lithography system (100A, 100B), in particular for a EUV lithography system, comprising an optical element (202, 204, 206, 208) and an adjusting device (700), which is designed, during a heat-up phase of the beam-forming and illuminating system (200), to measure a field position and/or a pupil position of the beam-formingand illuminating system (200) and to adjust the orientation and/or position of the optical element (202, 204, 206, 208) in dependence on the measured field position and/or pupil position in order to keep the optical element (202, 204, 206, 208) in a desired position (SL).
本发明涉及一种光刻设备(100A,100B)的束形成和照明系统(200),特别是EUV光刻系统的束形成和照明系统,其包括:光学元件(202,204,206,208),以及调节装置(700),该调节装置设计为在束形成和照明系统(200)的加热阶段期间测量束形成和照明系统(200)的场位置和/或光瞳位置,并且根据所测量的场位置和/或光瞳位置调节光学元件(202,204,206,208)的取向和/或位置,以便将光学元件(202,204,206,208)保持在期望位置(SL)中。 |
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Bibliography: | Application Number: CN201980019157 |