Mask appearance defect detection system, method and device and storage medium

• Main Authors: ZHAO ZHENGYANG, ZHONG ZONGYU
• Format: Patent
• Language: Chinese; English
• Published: 13.10.2020
• Subjects: CALCULATING; COMPUTER SYSTEMS BASED ON SPECIFIC COMPUTATIONAL MODELS; COMPUTING; COUNTING; HANDLING RECORD CARRIERS; IMAGE DATA PROCESSING OR GENERATION, IN GENERAL; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; PRESENTATION OF DATA; RECOGNITION OF DATA; RECORD CARRIERS; TESTING

The invention discloses a mask appearance defect detection system, method and device and a storage medium. The system comprises an image processing server and an image acquisition device used for acquiring mask images of masks with appearance defects to be detected, wherein the image acquisition device is connected with the image processing server, and the image processing server is configured toexecute the following operations: receiving the mask images from the image acquisition device, judging whether the mask has appearance defects according to the mask image, under the condition that itis judged that the appearance defect exists in the mask, detecting the mask image by using a pre-trained appearance defect detection model, determining the defect position information of the appearance defect in the mask image, and optimizing the appearance defect detection model through the following operations: generating a plurality of sample defect images by using a preset CGAN model and maskdefect images with appearan