METHOD AND DEVICE FOR AUTOMATICALLY DETERMINING VALUES OF ADJUSTMENTS TO OPERATING PARAMETERS OF A DEPOSITION LINE

• Main Authors: KAUFFMANN THIERRY, SANDREARDONNAL ETIENNE, FAUCILLON YOHAN, GAJIC VOJISLAV
• Format: Patent
• Language: Chinese; English
• Published: 15.09.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MEASURING; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS; MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; PHYSICS; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TESTING

The determining method according to the invention comprises: obtaining (E10) a mathematical model relating at least one operating parameter of the deposition line to at least one quality function defined on the basis of at least one quality measurement characterizing the quality of a stack of thin layers deposited by the deposition line on a transparent substrate; obtaining (E50) a value of said at least one quality function from a value of said at least one quality measurement measured at the end of the deposition line on a stack of thin layers deposited by the deposition line on a substratewith the deposition line parameterized with a so-called current value of said at least one operating parameter; and automatically determining (E80) by means of the mathematical model a value of an adjustment of the current value of said at least one operating parameter allowing a discrepancy existing between the obtained value of said at least one quality function and a target value chosen for said at least one quality fu