PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND MANUFACTURING METHOD OF ITEMS

• Main Authors: FUKAMI SEIJI, KONO MICHIO, FUKUOKA RYOSUKE
• Format: Patent
• Language: Chinese; English
• Published: 15.09.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

The invention discloses a projection optical system, an exposure apparatus, and an article manufacturing method. The invention provides a projection optical system. The reflector comprises a first concave reflecting surface, a first convex reflecting surface, a second concave reflecting surface and a third concave reflecting surface, wherein the first concave reflecting surface, the first convex reflecting surface, the second concave reflecting surface and the third concave reflecting surface are arranged such that light from the object plane forms an image on the image plane by being reflected by the first concave reflecting surface, the first convex reflecting surface, the second concave reflecting surface, the first convex reflecting surface and the third concave reflecting surface in alisted order. 公开了投影光学系统、曝光装置及物品制造方法。本发明提供了一种投影光学系统，包含第一凹反射面、第一凸反射面、第二凹反射面和第三凹反射面，其中第一凹反射面、第一凸反射面、第二凹反射面和第三凹反射面被布置使得来自物面的光通过由第一凹反射面、第一凸反射面、第二凹反射面、第一凸反射面及第三凹反射面按照列举的顺序反射而在像面上形成图像。