Semiconductor structure
The invention discloses a semiconductor structure including a substrate, plural contact structures on the substrate, a group of first patterns which are above the contact structures and comprise a plurality of first curve patterns, and a group of second patterns, wherein the second patterns and the...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
25.08.2020
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a semiconductor structure including a substrate, plural contact structures on the substrate, a group of first patterns which are above the contact structures and comprise a plurality of first curve patterns, and a group of second patterns, wherein the second patterns and the first patterns are positioned on the same plane, the second patterns comprises a plurality of secondcurve patterns, and the plurality of first curve patterns and the plurality of second curve patterns are intersected with each other from an upper view.
本发明公开了一种半导体结构,包含衬底,复数个接触结构,位于所述衬底上,一组第一图案位于所述接触结构上方,其中所述第一图案包含有复数条第一曲线图案,以及一组第二图案与所述第一图案位于同一平面,其中所述第二图案包含有复数条第二曲线图案,其中从一上视图来看,所述复数条第一曲线图案与所述复数条第二曲线图案相互交叉。 |
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Bibliography: | Application Number: CN202010469714 |