SURFACE TREATMENT APPARATUS FOR SURFACE-TREATING POWDER AND METHOD OF SURFACE-TREATING POWDER USING THE SAME

• Main Authors: YOON TAE HO, OH SEUNG JEONG, PARK HYUNG SANG, CHA JIN HYEOK, PARK KUN WOO, KIM CHAE WOONG, HONG WOONG PYO, PARK JUNG YEON
• Format: Patent
• Language: Chinese; English
• Published: 25.08.2020
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSIONOF CHEMICAL INTO ELECTRICAL ENERGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a surface treatment apparatus for surface-treating powder and a method of the surface-treating powder using the same. The surface treatment apparatus includes a chamber defining an accommodation space therein, an injection part provided at a first end of the chamber so as to inject gas into the accommodation space, a discharge part provided at a second end of the chamber that is opposite the first end so as to discharge unreacted gas from the accommodation space, and at least one subchamber loaded in the accommodation space in the chamber between the first end and thesecond end, where powder is charged in the subchamber, and the subchamber includes a mesh structure provided in at least one surface of the subchamber so as to allow the gas to be introduced into thesubchamber, and the subchamber is movable from the first end to the second end. 本发明涉及用于表面处理粉末的表面处理设备和方法。该表面处理设备，包括：在其中限定容纳空间的腔室；设置在腔室的第一端的注入部，以便将气体注入到容纳空间中；设置在腔室的与第一端相对的第二端的排放部，以便从容纳空间排放未反应气体；以及至少一个子腔室，该至少一个子腔室装载在腔室的容纳空间中的第一端和