Evaporation source device and method for preparing large-area cadmium telluride film

• Main Authors: JIANG MENG, FAN JIANPING, MA LIYUN, LUO RUN, PAN JINGONG, FU GANHUA, PENG SHOU, ZHAO LEI, LUO YING
• Format: Patent
• Language: Chinese; English
• Published: 25.08.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses an evaporation source device and a method for preparing a large-area cadmium telluride film. The evaporation source device comprises a crucible, a heating unit and a temperature detection unit, wherein the middle part of the bottom of the crucible protrudes upwards to form a protruding groove; the heating unit is arranged around the crucible; the heating unit comprises heating resistors arranged on the side face of the crucible, the bottom of the protruding groove, the side face of the protruding groove and the two sides of the bottom of the crucible; the temperature detection unit is arranged around the crucible; and the temperature detection unit comprises thermocouple probes arranged on the side face of the crucible, the middle of the bottom of the protruding groove and the two sides of the bottom of the crucible. According to the evaporation source device and the method for preparing the large-area cadmium telluride film, the uniformity of the prepared large-area cadmium telluride