3-pentadecyl-phenol phenolic resin as well as preparation method and application thereof

• Main Authors: LIU WEI, WANG GUOYING, ZHANG MENG, GENG YUE, CUI HONG, FANG RUINA, WANG ZONGWU, PANG HONGJIAN, MA JINJU
• Format: Patent
• Language: Chinese; English
• Published: 25.08.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS; MATERIALS THEREFOR; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; THEIR PREPARATION OR CHEMICAL WORKING-UP

The invention particularly relates to 3-pentadecyl-phenol phenolic resin and a preparation method thereof. The phenolic resin is used for preparing a lithographic printing plate material. Compared with other resins, the special phenolic resin with a 3-pentadecyl-phenol structure has the advantages that the phenolic resin has a C15 long-chain structure at the meta-position of phenolic resin, so that the spatial free volume of the phenolic resin is large, and the phenolic resin has good intermolecular interaction with other components in a composition to generate good dissolving performance andrequired alkali resistance, solvent resistance and wear resistance. A lithographic printing plate material prepared from an infrared sensitive composition of the phenolic resin has good resistance toisopropanol erosion, and is not easily eroded and dissolved by printing chemicals in the use process, thereby being beneficial to prolonging the service life of the lithographic printing plate. 本发明具体涉及一种间十五烷基酚酚醛树脂及其制备方法，并将该酚醛树