Cleaning device of chemical mechanical polishing equipment

• Main Author: YANG YANHE
• Format: Patent
• Language: Chinese; English
• Published: 31.07.2020
• Subjects: CLEANING; CLEANING IN GENERAL; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

The invention discloses a cleaning device of chemical mechanical polishing equipment. The cleaning device comprises a bottom plate and a supporting plate; universal wheels are mounted at the lower endof the bottom plate; supporting columns and an air blower are fixed to the upper end of the bottom plate; the upper ends of the supporting columns are fixed to a sewage tank; a water storage tank isarranged at the upper end of the sewage tank; the upper end surface of the supporting plate is arranged obliquely; side plates are symmetrically fixed to the upper end of the supporting plate; one endof each side plate is fixed to a coaming; a water outlet and an air blowing opening are formed in the coaming; the water outlet is connected with the sewage tank through a water outlet pipe; the airblowing opening is connected with the air blower through an air inlet pipe; threaded holes are symmetrically formed in the upper side of the coaming; screws are arranged in the threaded holes; limiting blocks are fixed to the up