Plasma photoresist removing device

The invention relates to a plasma photoresist removing device. The device comprises a vacuum chamber, a rotating shaft penetrating through the bottom of the vacuum chamber in the vertical direction, arotating shaft driving mechanism in transmission connection with the bottom of the rotating shaft, a...

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Bibliographic Details
Main Authors LIU PENG, PAN YUNXIANG, PENG XINGCUI
Format Patent
LanguageChinese
English
Published 30.06.2020
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Summary:The invention relates to a plasma photoresist removing device. The device comprises a vacuum chamber, a rotating shaft penetrating through the bottom of the vacuum chamber in the vertical direction, arotating shaft driving mechanism in transmission connection with the bottom of the rotating shaft, an adjustable sample supporting mechanism arranged at the top of the rotating shaft, a plasma generating unit which is arranged in the vacuum chamber and is located above the adjustable sample supporting mechanism, a gas constant-temperature circulating system, a gas cylinder and a vacuum pump. Oneend of the gas constant-temperature circulating system is communicated with a side face of the vacuum chamber, the other end of the gas constant-temperature circulating system is communicated with thetop of the vacuum chamber, and the gas cylinder and the vacuum pump are communicated with the inside of the vacuum chamber. Compared with the prior art, according to the invention, the photoresist etching speed and uniformity
Bibliography:Application Number: CN202010233331