Process monitoring

• Main Authors: SHEMESH DROR, BULLOCK EUGENE T, BOEHM ADI, SINGH GURJEET
• Format: Patent
• Language: Chinese; English
• Published: 19.06.2020
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MEASURING; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

A method for determining defective material elements is provided, and the method comprises the following steps: (a) obtaining an electromagnetic emission spectrum of a part of the defect through a charged particle beam system and applying a spectroscopy process; (b) using the charged particle beam system to acquire a backscattered electron (BSE) image of the area including the defect; and (c) determining the defect material element. The step of determining the defective material element includes the following steps: determining whether there is ambiguity in the electromagnetic emission spectrum; and when it is determined that the ambiguity exists, analyzing the ambiguity based on the BSE image. 一种用于确定缺陷材料元素的方法，所述方法包括以下步骤：(a)通过带电粒子束系统并通过应用光谱工艺来获取缺陷的一部分的电磁发射光谱；(b)通过所述带电粒子束系统获取包括所述缺陷的区域的背散射电子(BSE)图像；以及(c)确定缺陷材料元素。所述确定缺陷材料元素的步骤包括以下步骤：确定在所述电磁发射光谱中是否存在模糊性；以及当确定存在所述模糊性时，基于所述BSE图像来解析所述模糊性。