Light-emitting diode and manufacturing method thereof
The invention relates to a manufacturing method of a light emitting diode. The method comprises the steps that: (1) an epitaxial layer and a to-be-stripped sacrificial layer of the light emitting diode are formed through an epitaxial growth process, and the to-be-stripped sacrificial layer is locate...
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Main Author | |
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Format | Patent |
Language | Chinese English |
Published |
09.06.2020
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Subjects | |
Online Access | Get full text |
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Summary: | The invention relates to a manufacturing method of a light emitting diode. The method comprises the steps that: (1) an epitaxial layer and a to-be-stripped sacrificial layer of the light emitting diode are formed through an epitaxial growth process, and the to-be-stripped sacrificial layer is located on one side of the epitaxial layer; (2) the sacrificial layer is treated through a photomask process and an etching process, so that a sacrificial layer pattern can be formed, and one side of the epitaxial layer around the sacrificial layer pattern is partially exposed; (3) the surface of the sacrificial layer pattern and one side of the epitaxial layer are covered with a to-be-patterned insulating layer; and (4) the sacrificial layer pattern and the insulating layer on the surface of the sacrificial layer are stripped through a wet etching process, so that a patterned insulating layer can be formed.
一种发光二极管的制作方法,包括:(1)通过外延生长工艺形成发光二极管的外延层以及待剥离牺牲层,待剥离牺牲层位于外延层的一面侧;(2)通过光罩工艺和蚀刻工艺处理所述牺牲层,形成牺牲层图形,在牺牲层图形周围外延层的所述一面侧被部分暴 |
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Bibliography: | Application Number: CN202010151621 |