Film forming apparatus and method, and manufacturing system and method of organic EL panel

• Main Authors: TAKATSU KAZUMASA, KOUNO TAKASHI
• Format: Patent
• Language: Chinese; English
• Published: 21.04.2020
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to a film forming apparatus, a manufacturing system, a manufacturing system of an organic EL panel, a film forming method, and a manufacturing method of an organic EL element. Inorder to improve the utilization efficiency and productivity of a vapor deposition material in a vapor deposition apparatus, if a plurality of vapor deposition tables are provided in one vacuum chamber, the volume of the vacuum chamber is increased and the cost of the apparatus is increased in order to ensure a working space when a substrate is replaced. A second mask support part (25) of a second vapor deposition table (32) is lowered to a position lower than that during vapor deposition until vapor deposition of an undeposited substrate provided at the film formation position of a first vapor deposition table (28) is completed, the substrate that has undergone vapor deposition and that is supported by a second substrate support part (24) is replaced with a substrate that is not deposited by using a substrate co