Control of reticle placement for defectivity optimization

• Main Authors: RIZO DIAGO PEDRO, BENDIKSEN AAGE, JUDGE ANDREW
• Format: Patent
• Language: Chinese; English
• Published: 31.03.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

A system designed to couple a patterning device to a support structure having a plurality of burls includes a camera module, an actuator, and a controller. The camera module is designed to capture image data of a backside of the patterning device. The actuator is coupled to at least one burl of the plurality of burls and is designed to move the at least one burl. The controller is designed to receive the image data captured from the camera module and determine one or more locations of contamination on the backside of the patterning device from the image data. The controller is also designed tocontrol the actuator to move the at least one burl of the plurality of burls away from the one or more locations of contamination on the backside of the patterning device, based on the determined locations of contamination. 一种设计用于将图案形成装置耦接到具有多个突节的支撑结构的系统，包括照相机模块、致动器和控制器。照相机模块被设计成捕获图案形成装置的背面的图像数据。致动器被耦接到多个突节中的至少一个突节，并且被设计为移动所述至少一个突节。控制器被设计为接收来自照相机模块的被捕获的图像数据，并根据图像数据确定图案形成装置的背面上的一个或更多个污染物部位。所述控制器还被设计为控制所述致动器，以基于所确定的污染物部位，使