Adjusting device of remote plasma source and remote plasma source cleaning system

• Main Authors: WEI JINGFENG, RONG YANDONG
• Format: Patent
• Language: Chinese; English
• Published: 24.03.2020
• Subjects: CLEANING; CLEANING IN GENERAL; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; TRANSPORTING

The invention provides an adjusting device of a remote plasma source. The adjusting device is arranged between the remote plasma source and a reaction chamber. The adjusting device comprises a fixed bracket and at least three adjusting assemblies, wherein the fixed bracket is arranged at the top part of the reaction chamber; each adjusting assembly is connected with the remote plasma source and the fixing bracket; and each adjusting assembly is used for adjusting the height of the connecting position of the remote plasma source and the adjusting assembly. The adjusting device of the remote plasma source provided by the invention can adjust the remote plasma source to a horizontal position, so that the compression amount of a sealing ring is uniform, the leakage of a cleaning gas is avoided, and the maintenance of the remote plasma source is facilitated. 本发明提供一种远程等离子源的调整装置，设置在远程等离子源与反应腔室之间；调整装置包括固定支架和至少三个调整组件，其中，固定支架设置在反应腔室的顶部；每个调整组件分别与远程等离子源和固定支架连接，并且每个调整组件用于调节远程等离子源与该调整组件连接位置处的高度。本发明提供的远程等离子源的调整装置能够将远程等离子源调整