DEFECT PREDICTION

• Main Authors: KEA MARC JURIAN, GENIN MAXIME PHILIPPE FREDERIC, YUDHISTIRA YASRI, CHEONG LIN LEE, LA FONTAINE BRUNO
• Format: Patent
• Language: Chinese; English
• Published: 06.03.2020
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A method includes the steps of: obtaining verified values of a characteristic of a plurality of patterns on a substrate produced by a device manufacturing process; obtaining computed values of the characteristic using a non-probabilistic model; obtaining values of a residue of the non-probabilistic model based on the verified values and the computed values; and obtaining an attribute of a distribution of the residue based on the values of the residue. Also disclosed herein are methods of computing a probability of defects on a substrate produced by the device manufacturing process, and of obtaining an attribute of a distribution of the residue of a non-probabilistic model. 一种方法，包括获得由器件制造过程产生的衬底上的多个图案的特征验证值；使用非概率模型获得特征计算值；基于验证值和计算值获得非概率模型的残差值；以及基于残差值获得残差分布的属性。本文还公开了计算由器件制造过程产生的衬底上的缺陷的概率的方法，以及获得非概率模型残差分布的属性的方法。