Technology for preparing composite dielectric plate based on low dielectric constant turning film
The invention discloses a technology for preparing a composite dielectric plate based on a low dielectric constant turning film. According to the technology, a perfluoro resin turning film which has avolume fraction of 20.0 to 65.0%, has low dielectric constant, and contains silicon dioxide ceramic...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
04.02.2020
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Subjects | |
Online Access | Get full text |
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Summary: | The invention discloses a technology for preparing a composite dielectric plate based on a low dielectric constant turning film. According to the technology, a perfluoro resin turning film which has avolume fraction of 20.0 to 65.0%, has low dielectric constant, and contains silicon dioxide ceramic powder, a glass fibric dip piece which has a volume fraction of 9.0 to 70.0% and contains polytetrafluoroethylene, and a perfluoro resin turning film which has a volume fraction of 10.0 to 56.5% which have the same breadth are stacked to form a dielectric layer in an up-down symmetrical mode; a copper foil covers the upper and lower surfaces of the dielectric layer; and a sintering process which has the temperature of 360 DEG C to 390 DEG C , the pressure of 3 to 13 MPa, and the hot pressing time of 2 to 5 h is adopted, so that the perfluoro resin turning film is fused, spliced, and eventually shaped to prepare the composite dielectric plate with the dielectric constant of 2.14 to 2.74. Theplate has the characteris |
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Bibliography: | Application Number: CN201911061683 |