Technology for preparing composite dielectric plate based on low dielectric constant turning film

The invention discloses a technology for preparing a composite dielectric plate based on a low dielectric constant turning film. According to the technology, a perfluoro resin turning film which has avolume fraction of 20.0 to 65.0%, has low dielectric constant, and contains silicon dioxide ceramic...

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Bibliographic Details
Main Authors GAO SHUJIAN, WEI XI, ZHANG WEI, PANG ZIBO, JI XIUFENG
Format Patent
LanguageChinese
English
Published 04.02.2020
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Summary:The invention discloses a technology for preparing a composite dielectric plate based on a low dielectric constant turning film. According to the technology, a perfluoro resin turning film which has avolume fraction of 20.0 to 65.0%, has low dielectric constant, and contains silicon dioxide ceramic powder, a glass fibric dip piece which has a volume fraction of 9.0 to 70.0% and contains polytetrafluoroethylene, and a perfluoro resin turning film which has a volume fraction of 10.0 to 56.5% which have the same breadth are stacked to form a dielectric layer in an up-down symmetrical mode; a copper foil covers the upper and lower surfaces of the dielectric layer; and a sintering process which has the temperature of 360 DEG C to 390 DEG C , the pressure of 3 to 13 MPa, and the hot pressing time of 2 to 5 h is adopted, so that the perfluoro resin turning film is fused, spliced, and eventually shaped to prepare the composite dielectric plate with the dielectric constant of 2.14 to 2.74. Theplate has the characteris
Bibliography:Application Number: CN201911061683