Low coefficient of friction ethylene-based compositions

• Main Authors: ONGAYI OWENDI, LLOP COSME
• Format: Patent
• Language: Chinese; English
• Published: 17.01.2020
• Subjects: AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMISTRY; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; GENERAL PROCESSES OF COMPOUNDING; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; ORGANIC MACROMOLECULAR COMPOUNDS; PERFORMING OPERATIONS; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; WORKING-UP

The present disclosure provides a composition. The composition contains (A) an ethylene-based polymer; and (B) a slip agent blend, the slip agent blend containing (i) from greater than 50 wt% to 99 wt% of a first polydimethylsiloxane having a number average molecular weight (Mn) from 30,000 g/mol to less than 300,000 g/mol; and (ii) from 1 wt% to less than 50 wt% of a second polydimethylsiloxane having a number average molecular weight (Mn) from 300,000 g/mol to 2,000,000 g/mol, based on the total weight of the slip agent blend. The present disclosure also provides a film with a layer containing said composition. 本公开提供一种组合物。所述组合物含有：(A)乙烯类聚合物；和(B)助滑剂掺合物，按所述助滑剂掺合物的总重量计，所述助滑剂掺合物含有(i)大于50wt％到99wt％的第一聚二甲基硅氧烷，其数量平均分子量(Mn)是30,000g/mol到小于300,000g/mol；和(ii)1wt％到小于50wt％的第二聚二甲基硅氧烷，其数量平均分子量(Mn)是300,000g/mol到2,000,000g/mol。本公开也提供一种具有含有所述组合物的层的膜。