Spin orbit torque device with insertion layer between spin orbit torque electrode and free layer for improved performance
An insertion layer (103) for perpendicular spin orbit torque (SOT) memory devices between the SOT electrode (102) and the free magnetic layer (112), memory devices and computing platforms employing such insertion layers, and methods for forming them are discussed. The insertion layer is predominantl...
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Main Authors | , , , , , , , , , |
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Format | Patent |
Language | Chinese English |
Published |
07.01.2020
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Subjects | |
Online Access | Get full text |
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Summary: | An insertion layer (103) for perpendicular spin orbit torque (SOT) memory devices between the SOT electrode (102) and the free magnetic layer (112), memory devices and computing platforms employing such insertion layers, and methods for forming them are discussed. The insertion layer is predominantly tungsten and improves thermal stability and perpendicular magnetic anisotropy in the free magneticlayer.
讨论了用于SOT电极和自由磁性层之间的垂直自旋轨道矩(SOT)存储器件的插入层,采用这种插入层的存储器件和计算平台,以及形成它们的方法。插入层主要是钨,并改善了自由磁性层中的热稳定性和垂直磁各向异性。 |
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Bibliography: | Application Number: CN201910451081 |