X射线暗场成像中的射束硬化校正

本发明涉及包括第一材料和第二材料的对象的X射线暗场成像中的射束硬化校正，第一和第二材料具有不同的射束硬化性质。由于X射线成像数据包括关于成像对象的内部结构的信息，因此这样的信息可以连同适当的校准数据一起用于识别在对象的成像区中发生的射束硬化贡献，从而允许对由于X射线暗场成像中的射束硬化的伪影的校正。 The invention relates to beam hardening correction in X-ray Dark-Field imaging of a subject including a first material and a second material, the fir...

Full description

Saved in:
Bibliographic Details
Format Patent
LanguageChinese
Published 29.09.2023
Subjects
DETECTING MASSES OR OBJECTS
DIAGNOSIS
GEOPHYSICS
GRAVITATIONAL MEASUREMENTS
HUMAN NECESSITIES
HYGIENE
IDENTIFICATION
MEASURING
MEDICAL OR VETERINARY SCIENCE
PHYSICS
SURGERY
TESTING
Online AccessGet full text

Cover

More Information
Summary:本发明涉及包括第一材料和第二材料的对象的X射线暗场成像中的射束硬化校正，第一和第二材料具有不同的射束硬化性质。由于X射线成像数据包括关于成像对象的内部结构的信息，因此这样的信息可以连同适当的校准数据一起用于识别在对象的成像区中发生的射束硬化贡献，从而允许对由于X射线暗场成像中的射束硬化的伪影的校正。 The invention relates to beam hardening correction in X-ray Dark-Field imaging of a subject including a first material and a second material, the first and second material having different beam hardening properties. As the X-ray imaging data includes information on the internal structure of the imaged subject, such information maybe used, together with appropriate calibration data to identify the beam hardening contributions occurring in the imaged area of the subject, so to allow for a correction of artifacts due to beam hardening in X-ray Dark-Field imaging.
Bibliography:Application Number: CN201880033090