APPARATUS AND METHOD FOR THE GAS TREATMENT

• Main Authors: MARTINI LUCA MATTEO, DILECCE GIORGIO, TOSI PAOLO
• Format: Patent
• Language: Chinese; English
• Published: 06.12.2019
• Subjects: PERFORMING OPERATIONS; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL; SEPARATION; TRANSPORTING

The apparatus (1) for the gas treatment, comprises a reaction chamber (2), in turn comprising: an inlet opening (3) of a flow of gas to be treated (4); means for the formation (7) of ionizing electrical discharges (8) adapted to interact with the gas to be treated (4) to form a plasma state for obtaining a flow of treated gas (6) comprising at least a high-added value fraction (31) and at least awaste fraction (32); an outlet opening (5) of the high-added value fraction (31) arranged downstream of the means for the formation (7) with respect to the direction of forward movement (D) of the flow of gas to be treated (4) inside the reaction chamber (2); reintroduction means (33, 34, 35) for reintroducing the waste fraction (32) inside the reaction chamber (2), the reintroduction means (33, 34, 35) being arranged downstream of the means for the formation (7) with respect to the direction of forward movement (D). 本发明涉及用于气体处理的设备(1)，所述设备(1)包括反应腔室(2)，所述反应腔室(2)包括：-待处理气体(4)的气流的入口开口(3)；-电离放电(8)的形成装置(7)，所述电离放电(8)适于与待处理气体