Stage system and metrology tool

• Main Authors: HEMPENIUS PETER, VAN DE GROES HENRICUS, JULIANA SINAR, DE HOOG THOMAS, BAGGEN MARCEL
• Format: Patent
• Language: Chinese; English
• Published: 05.11.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

Disclosed is a stage system and metrology apparatus comprising at least one such stage system. The stage system comprises a stage carrier for holding an object and a stage carrier positioning actuatorfor displacing the stage carrier. The stage system also comprises a balance mass to counteract a displacement of the stage carrier, and a balance mass positioning actuator for displacing the balancemass. A cable arrangement is connected to the stage carrier for the supply of at least power to said stage carrier. The stage system is operable to apply a compensatory feed-forward force to the balance mass which compensates for a cable arrangement force exerted by the cable arrangement. 公开了一种平台系统和一种包括至少一个这样的平台系统的量测装置。平台系统包括用于保持物体的平台载体和用于使平台载体位移的平台载体定位致动器。平台系统还包括用于抵消平台载体的位移的平衡质量块、以及用于使平衡质量块移位的平衡质量块定位致动器。电缆装置连接到平台载体用于向上述平台载体提供至少电力。平台系统可操作以向平衡质量块施加补偿前馈力，该补偿前馈力补偿由电缆装置施加的电缆装置力。