VIRTUAL IMPEDANCE AUTO MATCHING BOX

The present invention relates to a method for automatically matching virtual impedance. The method comprises the steps of: (a) determining an input parameter of an RF generator and a load condition parameter of a plasma chamber for each process type, process recipe, and process step of each process...

Full description

Saved in:
Bibliographic Details
Main Authors KIM SEA WON, WI SOON IM, CHOI KOOK YOUNG, MOON HONG KWEON, BOO KYEUNG WOON
Format Patent
LanguageChinese
English
Published 01.11.2019
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:The present invention relates to a method for automatically matching virtual impedance. The method comprises the steps of: (a) determining an input parameter of an RF generator and a load condition parameter of a plasma chamber for each process type, process recipe, and process step of each process recipe; (b) applying an RF ON signal to an impedance matcher based on the input parameter of the RFgenerator for each process step; (c) determining whether an initial set position of a vacuum variable capacitor for load and a vacuum variable capacitor for tuning constituting the impedance matcher is within a matching range; (d) applying an RF OFF signal to the impedance matcher and generating a warning signal indicating the out of the matching range if the step (c) is not satisfied; (e) initiating matching by operating the impedance matcher if the step (c) is satisfied; (f) analyzing an amplitude error and phase error for 50+j0 according to impedance change in each process step, which succeeds the matching, to dete
Bibliography:Application Number: CN201910192335