Epitaxial process system and automatic transfer method thereof

• Main Authors: TAKAHIRO OISHI, HUANG TSAN-HUA, WONG KIAN-POH, NOBORU SUDA, HAN TSUNG-HSUN
• Format: Patent
• Language: Chinese; English
• Published: 29.10.2019
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

The invention relates to an epitaxial process system and an automatic transfer method thereof. The epitaxial process system provides a reaction module, a transmission module and a loading/unloading module, the transmission module and the loading/unloading module are respectively provided with two temporary storage mechanisms; the bearing disc for placing the wafer without the epitaxial reaction ismoved to the reaction cavity of the reaction module by one of the two temporary storage mechanisms of the loading/unloading module or one temporary storage mechanism of the transmission module so asto be matched with the ceiling to carry out the epitaxial reaction; in this way, the bearing disc and the ceiling are automatically conveyed among the reaction module, the conveying module and the loading/unloading module through the conveying module. 本发明是磊晶制程系统和其自动传送方法。所述磊晶制程系统提供反应模块、传送模块和载入/载出模块，传送模块和载入/载出模块分别具有二个暂存机构，放置未经磊晶反应的晶圆的承载盘由载入/载出模块的二个暂存机构之一或该传送模块的一个暂存机构被挪移至反应模块的反应腔体处以搭配顶棚进行磊晶反应，如此借由传送模块于反应模块、传送模块和载入/载出模块之间自动传送承