METHOD FOR TEXTURING SURFACE OF SEMICONDUCTOR MATERIAL AND DEVICE FOR CARRYING OUT THE METHOD

• Main Authors: DUMPELFELD WOLFGANG, KUHNLEIN HOLGER, STRAUB BENEDIKT, BURSCHIK JOHN
• Format: Patent
• Language: Chinese; English
• Published: 25.10.2019
• Subjects: APPARATUS THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; METALLURGY; PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS; SEMICONDUCTOR DEVICES

Disclosed is a method for texturing at least one portion (4) of a surface of a semiconductor material (2), according to which the at least one portion (4) of the surface is brought into contact with an etching solution (6); the at least one portion (4) of the surface is electrically conductively connected to a plus pole (9) of a current source (8) and is used as a positive electrode (16); a negative electrode (14) located in the etching solution (6) is electrically conductively connected to a minus pole (10) of the current source (18) and electric current is carried from the plus pole (9) to the minus pole (10) and the at least one portion (4) of the surface is thus electrochemically etched. Also disclosed is a device (1; 30; 70) for carrying out said method. 公开了一种对半导体材料(2)的表面的至少一部分(4)进行纹理化的方法，其中表面的所述至少一部分(4)与蚀刻溶液(6)接触；表面的所述至少一部分(4)以导电方式连接到电源(8)的正极(9)并被用作正电极(16)；设置在蚀刻溶液(6)中的负电极(14)以导电方式连接到电源(10)的负极(18)且电流从正极(9)传导到负极(10)，且以这种方式表面的所述至少一部分(4)被电化学蚀刻。还公开了用于实施该方法的设备(1；30；70)。