PHOTOSENSITIVE RESIN COMPOSITION, CURED PATTERN PRODUCTION METHOD, CURED PRODUCT, INTERLAYER INSULATING FILM, COVER COAT LAYER, SURFACE PROTECTIVE LAYER, AND ELECTRONIC COMPONENT
Provided is a photosensitive resin composition containing component (a), component (b1) and component (b2). (a) a polyimide precursor having structural units represented by formula (1); (b1) one or more compounds selected from the group consisting of a compound represented by formula (11) and a comp...
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Format | Patent |
Language | Chinese English |
Published |
11.10.2019
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Abstract | Provided is a photosensitive resin composition containing component (a), component (b1) and component (b2). (a) a polyimide precursor having structural units represented by formula (1); (b1) one or more compounds selected from the group consisting of a compound represented by formula (11) and a compound represented by formula (12); (b2) one or more compounds selected from the group consisting of acompound represented by formula (21) and a compound represented by formula (22).
一种感光性树脂组合物,其包含下述(a)成分、(b1)成分和(b2)成分。(a)具有下述式(1)所表示的结构单元的聚酰亚胺前驱体;(b1)选自由下述式(11)所表示的化合物和下述式(12)所表示的化合物组成的组中的一种以上的化合物;(b2)选自由下述式(21)所表示的化合物和下述式(22)所表示的化合物组成的组中的一种以上的化合物。 |
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AbstractList | Provided is a photosensitive resin composition containing component (a), component (b1) and component (b2). (a) a polyimide precursor having structural units represented by formula (1); (b1) one or more compounds selected from the group consisting of a compound represented by formula (11) and a compound represented by formula (12); (b2) one or more compounds selected from the group consisting of acompound represented by formula (21) and a compound represented by formula (22).
一种感光性树脂组合物,其包含下述(a)成分、(b1)成分和(b2)成分。(a)具有下述式(1)所表示的结构单元的聚酰亚胺前驱体;(b1)选自由下述式(11)所表示的化合物和下述式(12)所表示的化合物组成的组中的一种以上的化合物;(b2)选自由下述式(21)所表示的化合物和下述式(22)所表示的化合物组成的组中的一种以上的化合物。 |
Author | NAMATAME YUTAKA KOIBUCHI YUKARI SAITO NOBUYUKI |
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DocumentTitleAlternate | 感光性树脂组合物、固化图案的制造方法、固化物、层间绝缘膜、覆盖涂层、表面保护膜和电子部件 |
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Notes | Application Number: CN201880013138 |
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Snippet | Provided is a photosensitive resin composition containing component (a), component (b1) and component (b2). (a) a polyimide precursor having structural units... |
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SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP |
Title | PHOTOSENSITIVE RESIN COMPOSITION, CURED PATTERN PRODUCTION METHOD, CURED PRODUCT, INTERLAYER INSULATING FILM, COVER COAT LAYER, SURFACE PROTECTIVE LAYER, AND ELECTRONIC COMPONENT |
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