Method for preparing tungsten oxide nanorod through plasma pretreatment

• Main Authors: FAN HONGYU, NIU JINHAI, NI WEIYUAN
• Format: Patent
• Language: Chinese; English
• Published: 01.10.2019
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; METALLURGY; NANOTECHNOLOGY; PERFORMING OPERATIONS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; TRANSPORTING

The invention relates to a method for preparing a tungsten oxide nanorod through plasma pretreatment, and belongs to the field of engineering material preparation. According to the main technical scheme, the method comprises the following steps of carrying out pretreatment on a tungsten substrate by adopting hydrogen plasmas and annealing the pretreated tungsten substrate in a low-pressure oxygen-containing environment. By means of the method for preparing the tungsten oxide nanorod through plasma pretreatment, the uniformly dispersed, high-purity high-crystallization-degree tungsten oxide nanorods can be prepared under the temperature lower than 550 DEG C. The density and shape of the tungsten oxide nanorod can be controlled through processing time and oxygen partial pressure, sample grinding processes are not involved in the preparation process, no impurities are introduced, the recovery of waste gas or waste liquid is not involved, the pollution to the environment is avoided, and the operation is simple. 本