RETICLE CLAMPING DEVICE
Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holdi...
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Main Authors | , , , , |
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Format | Patent |
Language | Chinese English |
Published |
20.09.2019
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Subjects | |
Online Access | Get full text |
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Summary: | Systems and methods are disclosed that provide a support system in the Z direction for patterning devices that can function under high acceleration and deceleration with minimal effect on travel and hysteresis in the X and Y directions. A reticle clamping system includes a support device and a holding device. The holding device is configured to releasably couple a reticle to the support device. The holding device includes a plurality of burls. The reticle clamping system further includes a metallic support system coupled to the support device. The metallic support system provides a vacuum path from a vacuum channel to the holding device.
公开了为图案形成设备提供Z方向的支撑系统的系统和方法,该图案形成设备可以在对X和Y方向的行进和迟滞影响最小的条件下在高加速度和高减速度下工作。掩模版夹持系统包括支撑设备和保持设备。保持设备被配置为可释放地将掩模版耦合到支撑设备。保持设备包括多个突节。掩模版夹持系统还包括被耦合到支撑设备的金属支撑系统。金属支撑系统提供从真空通道到保持设备的真空路径。 |
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Bibliography: | Application Number: CN201880011018 |