GUIDING DEVICE AND ASSOCIATED SYSTEM

• Main Authors: ERSHOV ALEXANDER IGOREVICH, MOJAB SEYEDMOHAMMAD, NADIR KERIM, STEWART JOHN TOM, XIA CHUNGUANG, LABETSKI DZMITRY, DUARTE RODRIGES NUNES RUI MIGUEL, FEENSTRA KORNELIS FRITS, JOHNKADAKSHAM ARUN, KRAUSHAAR MATTHIAS, MA YUE, TEGENBOSCH HENRICUS GERARDUS, BERENDSEN CHRISTIANUS WILHELMUS JOHANNES, HUMMLER KLAUS MARTIN, FOMENKOV IGOR VLADIMIROVICH, LOGINOV MAKSIM, LANGLOIS MARC GUY, SHATALOV ALEXANDER, LAFORGE ANDREW DAVID
• Format: Patent
• Language: Chinese; English
• Published: 23.08.2019
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; X-RAY TECHNIQUE

A radiation source including a chamber including a plasma formation region, a radiation collector arranged in the chamber, the radiation collector configured to collect radiation emitted at the plasmaformation region and to direct the collected radiation to an intermediate focus region, a debris mitigation system configured to direct a first gas flow from the intermediate focus region towards theplasma formation region, and a guiding device arranged in the chamber such that the first gas flow is directed around the guiding device. A system and apparatus for reducing contamination of an innervessel wall of an EUV vessel is provided. The system and apparatus include inner vessel wall supplies of gas that introduce gas via a plurality of nozzles away from the inner vessel wall. The systemand apparatus also optionally include an asymmetric exhaust to exhaust gas from the EUV vessel while providing flow geometries that promote a direction of gas away from the inner vessel wall and an EUV collector within the EUV v