FUMED SILICA AND PRODUCTION METHOD THEREFOR

• Main Authors: TAKATA YUKIHIRO, UEDA MASAHIDE, HORITSUNE JUNYA
• Format: Patent
• Language: Chinese; English
• Published: 23.08.2019
• Subjects: ADHESIVES; BASIC ELECTRIC ELEMENTS; CHEMISTRY; COMPOUNDS THEREOF; DRESSING OR CONDITIONING OF ABRADING SURFACES; DYES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GLASS; GRINDING; INORGANIC CHEMISTRY; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE; METALLURGY; MINERAL OR SLAG WOOL; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; NON-METALLIC ELEMENTS; PAINTS; PERFORMING OPERATIONS; POLISHES; POLISHING; SEMICONDUCTOR DEVICES; TRANSPORTING

Provided is a fumed silica for chemical-mechanical polishing with which post-polishing scratches occurring on a surface of an object to be polished can be significantly reduced, and which is importantfor miniaturization and multi-layering of a structure. The fumed silica according to the present invention has a BET specific surface area of 57-400 m /g. In a liquid dispersion which is obtained by ultrasonically dispersing 6.25 mass% of this fumed silica in water at a vibration frequency of 20 kHz and an amplitude of 15-25 mu m for 3 minutes, the amount of residues on a sieve is 5 ppm or lessas measured by wet sieving using an electroformed sieve having a mesh opening size of 5 mu m. 本发明提供一种化学机械研磨用气相二氧化硅。能够显著地减少研磨后产生于被研磨物表面的刮痕，被研磨物表面刮痕的减少对于微细化、多层化来说是很重要的。本发明的气相二氧化硅的BET比表面积在57m/g以上400m/g以下，在振动频率20kHz、振幅15μm到25μm、3分钟的条件下，利用超声波让该气相二氧化硅在水中分散，形成该气相二氧化硅的量为6.25质量％的分散液，用筛孔尺寸5μm的电成型筛并采用湿筛法对该分散液进行筛分后，筛上残留量在5ppm以下。