Large-area atomic-level precision laser molecular beam epitaxial film preparation system and method

The invention discloses a large-area atomic-level precision laser molecular beam epitaxial film preparation system and method. The system comprises a rapid sample feeding chamber, a main chamber and accessories thereof, an excimer laser, a gas transmission assembly, a mechanical pump and a plurality...

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Bibliographic Details
Main Authors GAO CHUNLEI, YE BIYING, HUANG HAIMING, WU SHIWEI, WANG WENBIN, YIN LIFENG, ZHU YINYAN, YU YANG, SHEN JIAN
Format Patent
LanguageChinese
English
Published 20.08.2019
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Summary:The invention discloses a large-area atomic-level precision laser molecular beam epitaxial film preparation system and method. The system comprises a rapid sample feeding chamber, a main chamber and accessories thereof, an excimer laser, a gas transmission assembly, a mechanical pump and a plurality of molecular pumps. According to the preparation system and method, the full-reflecting mirror inthe laser light path is controlled through a two-axis stepping motor, an oxygen tube, a high-energy electron diffraction and a sample heating assembly in the system are modified, the sample frame andthe sample holder are redesigned, and uniform growth of a large sample is realized; the system and method has the advantages of being large in growth area, flat in surface, free of particulate mattersand consistent in physical properties of all regions; the automatic and manual growth of the sample can be realized by controlling equipment such as a laser light path and a target table. 本发明公开了一种大面积原子级精度激光分子束外延薄膜制备系统及方法。本发明系统包
Bibliography:Application Number: CN201910280729