Array substrate and manufacturing method thereof, and display panel

• Main Authors: ZHUO ENZONG, YONG WANFEI
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2019
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

The invention discloses an array substrate and manufacturing method thereof, and a display panel. The manufacturing method of the array substrate comprises the steps of: forming a first active switchcontaining a crystalline oxide semiconductor at the display region of an array substrate, and forming a second active switch containing a polysilicon semiconductor at the non-display region of the array substrate, wherein the crystalline oxide semiconductor and the polysilicon semiconductor are formed on the same layer. The power consumption of the circuit in the display region is reduced while the narrow frame is achieved; and moreover, after the oxide conductor and an amorphous silicon semiconductor are prepared on the same layer and then are subjected to crystallization process at the sametime so that the manufacture procedure of converting the amorphous silicon to the polycrystalline silicon is not influenced and the stability of the array substrate is increased. 本申请公开了一种阵列基板及其制造方法和显示面板。所述阵列基板的制作方法包括在阵列基板的显示区形