Mechanical automatic polishing device

• Main Author: GUO NANNAN
• Format: Patent
• Language: Chinese; English
• Published: 16.08.2019
• Subjects: DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; PERFORMING OPERATIONS; POLISHING; TRANSPORTING

The invention relates to the technical field of machining, and discloses a mechanical automatic polishing device. The mechanical automatic polishing device comprises a machine platform and a moving block. A limiting rod is horizontally and fixedly connected between the spaces of the upper portion of the machine platform, and a limiting hole which is matched with the limiting rod and allows the limiting rod to penetrate through is horizontally formed in the lower portion of the moving block. A threaded hole is horizontally formed in the upper portion of the moving block. Second bearings are horizontally embedded into the left side and the right side of the upper portion of the machine platform in an alignment mode, and a positive and negative motor is fixedly installed on the right side ofthe upper portion of the machine platform. According to the mechanical automatic polishing device, when a polishing disc makes contact with the upper surface of a steel plate, the polishing effect ofthe polishing disc can be