Device and method for preparing porous thermal barrier coating through low-temperature plasma

• Main Authors: XIE PENGCHENG, YANG WEIMIN, WANG RUIXUE, DING YUMEI, YE BADING
• Format: Patent
• Language: Chinese; English
• Published: 23.07.2019
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention discloses a device and a method for preparing a porous thermal barrier coating through a low-temperature plasma. The device and the method are mainly applied to preparing of a coating onthe surface of an injection mold cavity. The device comprise a plasma reaction cavity, a high-voltage power source, a three-dimensional moving platform containing an insert, a preheating table, a precursor sample pond, a hole forming agent sample pond, a gas path controller, a gas bottle, a vacuum pump, a high-voltage electrode, a ground electrode, a reaction chamber and a to-be machined base body. Discharge is generated between the high-voltage electrode and the ground electrode through the high-voltage power source, the discharge plasma is formed through inflation of carrier gas and excitation gas, a precursor and a hole forming agent in a solution are conveyed into the plasma reaction cavity through the carrier gas, and the porous thermal barrier coating is formed on the surface of thebase body under the actio